What is Ion implantation

The conductivity of the semiconductor increases when small impurity is added to it the process of adding impurity is called doping while the impurity to be added is called dopant so Ion implantation is a process of adding dopant to the Silicon substrate. The ion implantation process is controllable reproducible and also there are no unwanted side effects.

What is mean by diffusion

The process of introducing impurities in to the selected regions of silicon wafer is called diffusion. The rate at which various impurities diffuse into the Silicon will be of the order of 1 micro metre per hour at the temperature range of 900 degree Celsius 1100 degree Celsius. The utility and terms of the tendency to move from regions of Ion concentration to lower concentration.